Seiichiro Higashi - Concepedia

Author

Seiichiro Higashi

Also Known As

S Higashi, S. HIGASHI, S. Higashi, Seiichiro HIGASHI, Seiichiro Higashi, Seiichiro Higashi Seiichiro Higashi, Sota Higashi

295

Publications

1.6K

Citations

H-Index

Concepts

All Affiliations

Hiroshima University Epson Information Technology College Tokyo University of Agriculture and Technology Seiko Holdings (Japan)Nagoya University

About

Seiichiro Higashi is an author at Hiroshima University specializing in applied physics, engineering, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	20	38	954
2	Applied Physics	20	35	898
3	Medicine	2	2	49
4	Education	1	1	14
5	Allergy	1	1	29

Seiichiro Higashi

Publications

1.2K

Citations

H-Index

Page 1

	Year	Citations
Milk fermented by<i>Lactobacillus gasseri</i>SBT2055 influences adipocyte size via inhibition of dietary fat absorption in Zucker rats Essam M. Hamad, Masao Sato, Kazunori Uzu, British Journal Of Nutrition	2008	135
Overdense Plasma Production Using Electron Cyclotron Waves Masayoshi Y. Tanaka, Ryuji Nishimoto, Seiichiro Higashi, Journal of the Physical Society of Japan EngineeringPhysicsDensity LimitApplied PhysicsRelativistic Plasma	1991	61
Crystallization of amorphous Ge films induced by semiconductor diode laser annealing Kouhei Sakaike, Seiichiro Higashi, Hironaru Murakami, Thin Solid Films Materials ScienceEngineeringCrystal Growth TechnologyApplied PhysicsAmorphous Ge Films	2007	55
Pulsed-Laser-Induced Microcrystallization and Amorphization of Silicon Thin Films Seiichiro Higashi, Toshiyuki Sameshima Japanese Journal of Applied Physics Materials ScienceSi Thin FilmsEngineeringMicrofabricationSurface Science	2001	49
Native Oxidation Growth on Ge(111) and (100) Surfaces Siti Kudnie Sahari, Hideki Murakami, Tomohiro Fujioka, Japanese Journal of Applied Physics Surface CharacterizationNative OxidationChemical EngineeringEngineeringSurface Chemistry	2011	48
High-Quality SiO<sub>2</sub>/Si Interface Formation and Its Application to Fabrication of Low-Temperature-Processed Polycrystalline Si Thin-Film Transistor Seiichiro Higashi, Daisuke Abe, Yasushi Hiroshima, Japanese Journal of Applied Physics Materials ScienceElectrical EngineeringElectronic DevicesEngineeringElectronic Materials	2002	43
Heat Treatment with High-Pressure H<sub>2</sub>O Vapor of Pulsed Laser Crystallized Silicon Films K Asada, Keiji Sakamoto, Tadashi Watanabe, Japanese Journal of Applied Physics EngineeringLaser ApplicationsLaser MaterialHigh-pressure H 2Optoelectronic Devices	2000	42
A new crystallization technique of Si films on glass substrate using thermal plasma jet Hirotaka Kaku, Seiichiro Higashi, Hitoshi Taniguchi, Applied Surface Science Materials ScienceSi FilmsEngineeringMicrofabricationThermal Plasma Jet	2005	42
Application of Plasma Jet Crystallization Technique to Fabrication of Thin-Film Transistor Seiichiro Higashi, Hirotaka Kaku, Hideki Murakami, Japanese Journal of Applied Physics EngineeringThin-film TransistorThin Film Process TechnologyPlasma ProcessingCrystallized Films	2004	37
Improvement of Electrical Properties of Pulsed Laser Crystallized Silicon Films by Oxygen Plasma Treatment Yoshiyuki Tsunoda Yoshiyuki Tsunoda, Toshiyuki Sameshima, Seiichiro Higashi Japanese Journal of Applied Physics Optical MaterialsEngineeringLaser ApplicationsLaser MaterialOptoelectronic Devices	2000	35

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