Keiichiro Kashihara

Suppression of Anomalous Gate Edge Leakage Current by Control of Ni Silicidation Region using Si Ion Implantation Technique

Tadashi Yamaguchi, Keiichiro Kashihara, T. Okudaira et al. · 2006 · 14 citations

Engineering, Computer Engineering, Electrical Engineering +17

Low-energy recoil-ion spectroscopy studies of hydrogen adsorption on Si(100)-2 × 1 surfaces

Fumiya Shoji, Keiichiro Kashihara, Koji Sumitomo et al. · Surface Science · 1991 · 13 citations

Natural Sciences, Materials Science, Physics +14

Improvement of thermal stability of nickel silicide using N<inf>2</inf>ion implantation prior to nickel film deposition

Keiichiro Kashihara, Tadashi Yamaguchi, T. Okudaira et al. · 2006 · 12 citations

Engineering, Materials Engineering, Materials Science +17

Neutralization and inelastic scattering energy loss of low energy He+ ions at InP(110) surfaces

Fumiya Shoji, Keiichiro Kashihara, Teruo Hanawa et al. · Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 1990 · 10 citations

Natural Sciences, Materials Science, Physics +13

Anomalous Nickel Silicide Encroachment in n-Channel Metal–Oxide–Semiconductor Field-Effect Transitors on Si(110) Substrates and Its Suppression by Si⁺ Ion-Implantation Technique

Tadashi Yamaguchi, Keiichiro Kashihara, Shuichi Kudo et al. · Japanese Journal of Applied Physics · 2009 · 10 citations

Engineering, Electrical Engineering, Materials Science +13