Michael J. Leeson

Acid distribution in chemically amplified extreme ultraviolet resist

Takahiro Kozawa, Seiichi Tagawa, Heidi B. Cao et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2007 · 152 citations

Ultraviolet Light, Chemical Engineering, Optical Materials +15

Polymer-Structure Dependence of Acid Generation in Chemically Amplified Extreme Ultraviolet Resists

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa et al. · Japanese Journal of Applied Physics · 2007 · 71 citations

Engineering, Electron-beam Lithography, Acid Generation +18

Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers

Kirsten Lawrie, Idriss Blakey, James P. Blinco et al. · Journal of Materials Chemistry · 2011 · 52 citations

Engineering, Responsive Polymers, Chemistry +24

Investigation of novel inorganic resist materials for EUV lithography

Marie Krysak, James M. Blackwell, Steve Putna et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 27 citations

High Resolution, Engineering, Electron-beam Lithography +20

Behavior of Lamellar Forming Block Copolymers under Nanoconfinement: Implications for Topography Directed Self-Assembly of Sub-10 nm Structures

Imelda Keen, Han‐Hao Cheng, Anguang Yu et al. · Macromolecules · 2013 · 26 citations

Engineering, Molecular Self-assembly, Polymer Chains +23