A. Y. Mao

Chemical vapor deposition of ultrathin Ta2O5 films using Ta[N(CH3)2]5

Kirak Son, A. Y. Mao, Yong Sun et al. · Applied Physics Letters · 1998 · 46 citations

Natural Sciences, Materials Engineering, Materials Science +16

Ultrathin Ta2O5 film growth by chemical vapor deposition of Ta(N(CH3)2)5 and O2 on bare and SiOxNy-passivated Si(100) for gate dielectric applications

Kirak Son, A. Y. Mao, B. Y. Kim et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1998 · 36 citations

Natural Sciences, Materials Engineering, Materials Science +17

Ultra Thin High Quality Ta₂O₅Gate Dielectrics Prepared by<i>In-situ</i>Rapid Thermal Processing

H.F. Luan, S. J. Lee, C. H. Lee et al. · MRS Proceedings · 1999 · 20 citations

Natural Sciences, Materials Engineering, Materials Science +10

Annealing ultra thin Ta2O5 films deposited on bare and nitrogen passivated Si(100)

A. Y. Mao, Kirak Son, D. A. Hess et al. · Thin Solid Films · 1999 · 19 citations

Natural Sciences, Materials Engineering, Materials Science +11

Effects of vacuum and inert gas annealing of ultrathin tantalum pentoxide films on Si(100)

A. Y. Mao, Kirak Son, J.M. White et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1999 · 18 citations

Engineering, Materials Engineering, Materials Science +17