J. Y. Tsai

Metal Silicides: Active elements of ULSI contacts

C. M. Osburn, J. Y. Tsai, Jay J. Sun · Journal of Electronic Materials · 1996 · 47 citations

Engineering, Materials Engineering, Materials Science +13

Improved stability of thin cobalt disilicide films using BF2 implantation

Q. F. Wang, J. Y. Tsai, C. M. Osburn et al. · Applied Physics Letters · 1992 · 24 citations

Engineering, Materials Engineering, Materials Science +16

Effect of fluorine incorporation on the thermal stability of PtSi/Si structure

Bing‐Yue Tsui, J. Y. Tsai, Tzong-Shien Wu et al. · IEEE Transactions on Electron Devices · 1993 · 18 citations

Engineering, Materials Engineering, Materials Science +17

PREDICT 1.6: Modeling of Metal Silicide Processes

C. M. Osburn, J. Y. Tsai, Q. F. Wang et al. · Journal of The Electrochemical Society · 1993 · 15 citations

Engineering, Materials Engineering, Materials Science +15