Concepedia

Chris Cork

CC

Statistics

Publications

3

Citations

66

H-Index

3

Active since

2008

Affiliations

Synopsys (United States)(Current)

Chris Cork is an author at Synopsys (United States) specializing in mask design, engineering, and fabrication workflows.

Publications per year

2008–2012

3

Publications

3

<title>Implications of triple patterning for 14nm node design and patterning</title>

Kevin Lucas, Chris Cork, Bei Yu et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 35 citations · Full text

Engineering, Computer Engineering, Computer-aided Design +9

Interactions of double patterning technology with wafer processing, OPC and design flows

Kevin Lucas, Chris Cork, Alex Miloslavsky et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 21 citations

Engineering, Design, Digital Design +17

Decomposition difficulty analysis for double patterning and the impact on photomask manufacturability

Yuichi Inazuki, Nobuhito Toyama, Takaharu Nagai et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 10 citations

Engineering, Electrical Engineering, Manufacturing Engineering +13

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