Alex Miloslavsky

Layout decomposition of self-aligned double patterning for 2D random logic patterning

Yongchan Ban, Alex Miloslavsky, Kevin Lucas et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 37 citations

Self-aligned Double Pattering, Engineering, Vlsi Design +18

Interactions of double patterning technology with wafer processing, OPC and design flows

Kevin Lucas, Chris Cork, Alex Miloslavsky et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 21 citations

Wafer Processing, Engineering, Digital Manufacturing +21

Layout optimization with assist features placement by model based rule tables for 2x node random contact

Jinhyuck Jun, Minwoo Park, Chanha Park et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 19 citations

Rule Tables, Engineering, Node Random Contact +12

Design compliance for spacer is dielectric (SID) patterning

Gerard Luk-Pat, Alex Miloslavsky, Ben Painter et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 19 citations

Engineering, Computer-aided Design, Electromagnetic Compatibility +19

Avoiding wafer-print artifacts in spacer is dielectric (SID) patterning

Gerard Luk-Pat, Ben Painter, Alex Miloslavsky et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 11 citations