Michiharu Tabe

Etching of SiO₂ Films by Si in Ultra-High Vacuum

Michiharu Tabe · Japanese Journal of Applied Physics · 1982 · 110 citations

Natural Sciences, Materials Engineering, Materials Science +16

Single-Electron Transport through Single Dopants in a Dopant-Rich Environment

Michiharu Tabe, Daniel Moraru, Maciej Ligowski et al. · Physical Review Letters · 2010 · 101 citations

Engineering, Electrical Engineering, Physics +16

Photoluminescence from a Silicon Quantum Well Formed on Separation by Implanted Oxygen Substrate

Yasuo Takahashi, Tomofumi Furuta, Yukinori Ono et al. · Japanese Journal of Applied Physics · 1995 · 84 citations

Engineering, Materials Engineering, Materials Science +17

UV ozone cleaning of silicon substrates in silicon molecular beam epitaxy

Michiharu Tabe · Applied Physics Letters · 1984 · 84 citations

Natural Sciences, Materials Engineering, Materials Science +14

Atom devices based on single dopants in silicon nanostructures

Daniel Moraru, Arief Udhiarto, Miftahul Anwar et al. · Nanoscale Research Letters · 2011 · 80 citations · Full text

Engineering, Electrical Engineering, Physics +17