Physical Review Letters · 2010 · 101 citations · 30 references
EngineeringElectrical EngineeringPhysicsMicroelectronicsSemiconductor DevicesSemiconductor MaterialsCarrier TransportDopingElectron TransportNanoelectronicsRare-earth-doped MaterialsSemiconductor PhysicsChannel Doping EffectsDoped SemiconductorsDoping In NanostructuresKelvin Probe Force MicroscopyLow-temperature Scanning Probe MicroscopySingle-electron TransistorsTrapping Effects
We show that single-electron transport through a single dopant can be achieved even in a random background of many dopants without any precise placement of individual dopants. First, we observe potential maps of a phosphorus-doped channel by low-temperature Kelvin probe force microscopy, and demonstrate potential changes due to single-electron trapping in single dopants. We then show that only one or a small number of dopants dominate the initial stage of source-drain current vs gate voltage characteristics in scaled-down, doped-channel, field-effect transistors.
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A silicon-based nuclear spin quantum computer
B. E. Kane · Nature · 1998 · 3.8K citations
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M. Nonnenmacher, M. O’Boyle, H. K. Wickramasinghe · Applied Physics Letters · 1991 · 2.3K citations
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