Tzu-Heng Chang

A 0.13 μm CMOS technology with 193 nm lithography and Cu/low-k for high performance applications

K.K. Young, S.Y. Wu, Chung-Cheng Wu et al. · 2002 · 50 citations

Engineering, Computer Engineering, Electrical Engineering +15

High-k metal gate-bounded Silicon Controlled Rectifier for ESD protection

Tzu-Heng Chang, Yuying Hsu, Tsung-Che Tsai et al. · Electrical Overstress/Electrostatic Discharge Symposium · 2012 · 22 citations

Engineering, Electrical Engineering, Microelectronics +14

An on-chip combo clamp for surge and universal ESD protection in bulk FinFET technology

Ming-Fu Tsai, Jen-Chou Tseng, Chung-Yu Huang et al. · 2016 · 18 citations

Engineering, Electrical Engineering, Derivatives Regulation +11

Mass Accretion, Spectral, and Photometric Properties of T Tauri Stars in Taurus Based on TESS and LAMOST

Chia-Lung Lin, W.-H. Ip, Yao Hsiao et al. · The Astronomical Journal · 2023 · 18 citations · Full text

Natural Sciences, Astronomy, Physics +8

Deep N-well induced latch-up challenges in bulk FinFET technology

Chien-Yao Huang, Yu-Ti Su, Tzu-Heng Chang et al. · 2017 · 12 citations

Engineering, Computer Engineering, Electrical Engineering +17