B. N. Lin

Two threshold resist models for optical proximity correction

Wen‐Chun Huang, Chia-Hui Lin, Chin-Chen Kuo et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 35 citations

Resist Model, Photonics, Optical Materials +12

Immersion lithography and its impact on semiconductor manufacturing

B. N. Lin · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 26 citations

Optical Materials, Engineering, Electron-beam Lithography +17

Novel hexameric tin carboxylate clusters as efficient negative-tone EUV photoresists: high resolution with well-defined patterns under low energy doses

Jia‐Rong Wu, Ting‐An Lin, Yanru Wu et al. · Nanoscale Advances · 2023 · 25 citations · Full text

Partial decarboxylation of hafnium oxide clusters for high resolution lithographic applications

Pin-Chia Liao, Po-Hsiung Chen, Yu‐Fang Tseng et al. · Journal of Materials Chemistry C · 2022 · 18 citations

Engineering, Electron-beam Lithography, Microscopy +18

Anomalous Pr Ordering, Pr L3-Edge and Cu K-Edge XANES Studies for the Insulating PrBa2Cu3O7−y System

B. N. Lin, Yuxiao Lin, Yung-Yuan Hsu et al. · Journal of Low Temperature Physics · 2003 · 14 citations