Yue Hu

A manufacturable dual channel (Si and SiGe) high-k metal gate CMOS technology with multiple oxides for high performance and low power applications

Siddarth Krishnan, U. Kwon, N. Moumen et al. · 2011 · 81 citations

Sige Channels, Low Power Applications, Engineering +16

Impact of aggressive fin width scaling on FinFET device characteristics

Xiaoli He, Jody Fronheiser, Pei Zhao et al. · 2017 · 53 citations

Device Modeling, Electrical Engineering, Finfet Device Characteristics +10

Oxidative stress-induced mitophagy is suppressed by the miR-106b-93-25 cluster in a protective manner

Cheng Zhang, Pengqing Nie, Chunliu Zhou et al. · Cell Death and Disease · 2021 · 44 citations · Full text

Non-Intrusive Load Identification Method Based on Improved KM Algorithm

Yong Xiao, Yue Hu, Hengjing He et al. · IEEE Access · 2019 · 24 citations · Full text

Load Event Matching, Engineering, Load Control +18

Lighting the dark silicon by exploiting heterogeneity on future processors

Ying Zhang, Lu Peng, Xin Fu et al. · 2013 · 23 citations

Engineering, Vlsi Design, Computer Architecture +16