Wei Chen

Fabrication of 5–7 nm wide etched lines in silicon using 100 keV electron-beam lithography and polymethylmethacrylate resist

Wei Chen, H. Ahmed · Applied Physics Letters · 1993 · 263 citations

Engineering, Electron-beam Lithography, Bulk Si Substrates +16

Maskless inverted pyramid texturization of silicon

Yan Wang, Lixia Yang, Yaoping Liu et al. · Scientific Reports · 2015 · 129 citations · Full text

Silicon Wet, Miniaturization, Engineering +18

18.87%-efficient inverted pyramid structured silicon solar cell by one-step Cu-assisted texturization technique

Lixia Yang, Yaoping Liu, Yan Wang et al. · Solar Energy Materials and Solar Cells · 2017 · 97 citations

Electrical Engineering, Engineering, Energy Efficiency +8

Hybrid active/passive force control strategy for grinding marks suppression and profile accuracy enhancement in robotic belt grinding of turbine blade

Xiaohu Xu, Wei Chen, Dahu Zhu et al. · Robotics and Computer-Integrated Manufacturing · 2020 · 95 citations

Engineering, Material Machining, Profile Accuracy Enhancement +7

Difference in anisotropic etching characteristics of alkaline and copper based acid solutions for single-crystalline Si

Wei Chen, Yaoping Liu, Lixia Yang et al. · Scientific Reports · 2018 · 78 citations · Full text