Concepedia

T. Yoshii

TY

11

Publications

222

Citations

11

H-Index

1980

Active since

Affiliations

Toshiba (Japan)(Current)

T. Yoshii is an author at Toshiba (Japan) specializing in engineering, applied physics, and materials science.

Top concepts

EngineeringApplied PhysicsMaterial ScienceElectrical EngineeringMicroelectronicsMaterials EngineeringThin FilmsSemiconductorsNanoelectronicsSurface Science

Publications per year

1980–1991

11

Publications

11

Crystalline disorder reduction and defect-type change in silicon on sapphire films by silicon implantation and subsequent thermal annealing

Tomoyasu Inoue, T. Yoshii · Applied Physics Letters · 1980 · 43 citations

Materials Science, Crystalline Quality, Ion Implantation +15

Improvement of SOS Device Performance by Solid-Phase Epitaxy

T. Yoshii, S. Taguchi, Tomoyasu Inoue et al. · Japanese Journal of Applied Physics · 1982 · 39 citations · Full text

Materials Engineering, Materials Science, Electrical Engineering +15

High aspect ratio hole filling by tungsten chemical vapor deposition combined with a silicon sidewall and barrier metal for multilevel interconnection

K. Suguro, Yasushi Nakasaki, S. Shima et al. · Journal of Applied Physics · 1987 · 28 citations

Engineering, Multilevel Interconnection, Barrier Metal +17

Highly controllable pseudoline electron-beam recrystallization of silicon on insulator

Toshihiko Hamasaki, Tomoyasu Inoue, I. Higashinakagawa et al. · Journal of Applied Physics · 1986 · 24 citations

Materials Engineering, Materials Science, Electrical Engineering +10

Crystalline quality improvement of SOS films by SI implantation and subsequent annealing

Tomoyasu Inoue, T. Yoshii · Nuclear Instruments and Methods · 1981 · 16 citations

Materials Science, Epitaxial Growth, Engineering +10

Rows per page

1–5 of 11