Concepedia

Neha Thakur

NT

Statistics

Publications

10

Citations

298

H-Index

10

Active since

2017

Affiliations

Advanced Research Center for Nanolithography (Netherlands)(Current)

Paul Scherrer Institute

Institute for Atomic and Molecular Physics

University of Amsterdam

Neha Thakur is an author at Advanced Research Center for Nanolithography (Netherlands) specializing in engineering, chemistry, and nanotechnology.

Top concepts

EngineeringChemistryNanotechnologyApplied PhysicsMaterial ScienceNanomaterialsNanofabricationPhotochemistryNanophotonicsPhotocatalysis

Publications per year

2017–2022

10

Publications

10

Stability studies on a sensitive EUV photoresist based on zinc metal oxoclusters

Neha Thakur, Li‐Ting Tseng, Michaela Vockenhuber et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2019 · 48 citations · Full text

Engineering, Inorganic Photochemistry, Organic Electronics +22

Mixed-ligand zinc-oxoclusters: efficient chemistry for high resolution nanolithography

Neha Thakur, Roland Bliem, Iacopo Mochi et al. · Journal of Materials Chemistry C · 2020 · 45 citations · Full text

Materials Science, Engineering, Electron-beam Lithography +11

Universal direct patterning of colloidal quantum dots by (extreme) ultraviolet and electron beam lithography

Christian D. Dieleman, Weiyi Ding, Lianjia Wu et al. · Nanoscale · 2020 · 44 citations · Full text

Fluorine-Rich Zinc Oxoclusters as Extreme Ultraviolet Photoresists: Chemical Reactions and Lithography Performance

Neha Thakur, Michaela Vockenhuber, Yasin Ekinci et al. · ACS Materials Au · 2022 · 42 citations · Full text

Role of low-energy electrons in the solubility switch of Zn-based oxocluster photoresist for extreme ultraviolet lithography

Markus Rohdenburg, Neha Thakur, René Cartaya et al. · Physical Chemistry Chemical Physics · 2021 · 34 citations · Full text

Engineering, Electron-beam Lithography, Inorganic Photochemistry +22

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