Junji Tamano

Plasma polymerized methyl-methacrylate as an electron-beam resist

Shinzo Morita, Junji Tamano, Shūzo Hattori et al. · Journal of Applied Physics · 1980 · 74 citations

Engineering, Electron-beam Lithography, Methyl-methacrylate Thin Film +16

Electron Beam Vacuum Lithography Using a Plasma Co-Polymerized MMA–TMT Resist

Masao Yamada, Junji Tamano, Katsumi Yoneda et al. · Japanese Journal of Applied Physics · 1982 · 27 citations

Engineering, Electron-beam Lithography, Responsive Polymers +18

Vacuum lithography?A completely dry lithography using plasma processing

Junji Tamano, Shūzo Hattori, Shinzo Morita et al. · Plasma Chemistry and Plasma Processing · 1981 · 16 citations

Engineering, Electron-beam Lithography, Beam Lithography +6

Vacuum lithography using plasma polymerization and plasma development

Shūzo Hattori, Junji Tamano, Masao Yamada et al. · Thin Solid Films · 1981 · 12 citations

Materials Science, Engineering, Beam Lithography +6

A breakthrough to the plasma deposited dry‐developable <i>e</i>‐beam resist

Shūzo Hattori, Shinzo Morita, Masao Yamada et al. · Polymer Engineering and Science · 1983 · 10 citations

Materials Science, Materials Engineering, Engineering +9