Cheng-Tsung Lee

Novel polymeric anionic photoacid generators (PAGs) and corresponding polymers for 193 nm lithography

Mingxing Wang, Nathan D. Jarnagin, Cheng-Tsung Lee et al. · Journal of Materials Chemistry · 2006 · 51 citations

Optical Materials, Engineering, Chemistry +17

Novel chemically amplified resists incorporating anionic photoacid generator functional groups for sub-50-nm half-pitch lithography

Kenneth E. Gonsalves, Mingxing Wang, Cheng-Tsung Lee et al. · Journal of Materials Chemistry · 2009 · 29 citations

Organic Material Chemistry, Chemical Engineering, Engineering +15

Single molecule chemically amplified resists based on ionic and non-ionic PAGs

Richard A. Lawson, Cheng-Tsung Lee, Wang Yueh et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 24 citations

Engineering, Organic Chemistry, Chemistry +17

Incorporation of ionic photoacid generator (PAG) and base quencher into the resist polymer main chain for sub-50 nm resolution patterning

Mingxing Wang, Cheng-Tsung Lee, Clifford L. Henderson et al. · Journal of Materials Chemistry · 2008 · 23 citations

Engineering, Electron-beam Lithography, Ionic Photoacid Generator +17

Effects of photoacid generator incorporation into the polymer main chain on 193nm chemically amplified resist behavior and lithographic performance

Cheng-Tsung Lee, Clifford L. Henderson, Mingxing Wang et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2007 · 22 citations · Full text

Engineering, Electron-beam Lithography, Resist Materials +19