Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 24 citations · 0 references
EngineeringOrganic ChemistryChemistryChemical EngineeringSingle Molecule ResistsSingle MoleculeChemical SensorNon-ionic PagsMaterials ScienceNanotechnologyMolecular MaterialPhysical ChemistryNon-ionic Single MoleculeElectronic MaterialsNanomaterialsIonic ConductorMolecular SwitchMolecule-based MaterialAmplified ResistOrganic-inorganic Hybrid Material
An ionic and non-ionic single molecule chemically amplified resist have been synthesized, characterized, and imaged under high resolution e-beam. The ionic single molecule resist is based on a tBoc protected triarylsulfonium (TAS) core that generates a free superacid upon exposure. TAS demonstrates a low LER (3&sgr;) of 3.9 nm under 100 keV e-beam exposures with a resolution of 55 nm. Under EUV exposures, it exhibits a LER of 5.2 nm with a sensitivity of 60 mJ/cm2 and 50 nm half-pitch resolution. The non-ionic single molecule resist is based on a sulfonic acid containing molecular glass core that uses a norbornene dicarboximide PAG. It images with a low LER of 3.9 nm and a resolution of 40 nm. The non-ionic resist shows multiple improvements over the ionic system including improved resolution, reduced dark loss, and improved solubility. Both resists successfully demonstrate the feasibility of using a single component molecular resist system with high PAG loading. They also show that single molecule resists provide improved LER compared to conventional PAG blended systems, even for unoptimized systems.