Ja-Yong Kim

Review of Material Properties of Oxide Semiconductor Thin Films Grown by Atomic Layer Deposition for Next-Generation 3D Dynamic Random-Access Memory Devices

Ae Rim Choi, Dong Hyun Lim, So‐Yeon Shin et al. · Chemistry of Materials · 2024 · 42 citations

Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma

Dong-Kwon Lee, Zhixin Wan, Jong‐Seong Bae et al. · Materials Letters · 2015 · 31 citations

Materials Science, Sno2 Thin Films, Engineering +8

Low Voltage and High Speed 1Xnm 1T1C FE-RAM with Ultra-Thin 5nm HZO

Minchul Sung, Kwangmyoung Rho, Ja-Yong Kim et al. · 2021 IEEE International Electron Devices Meeting (IEDM) · 2021 · 27 citations

Capacitor Plate Voltage, Non-volatile Memory, Engineering +21

First-principles study of carbon impurity effects in the pseudo-hexagonal Ta2O5

Ja-Yong Kim, Blanka Magyari-Köpe, Yoshio Nishi et al. · Current Applied Physics · 2016 · 13 citations · Full text

Materials Science, Transition Metal Chalcogenides, Material Analysis +3