Concepedia

Author

David J. Houlton

Loughborough University

Also Known As

D. J. HOULTON, D. J. Houlton, David J. Houlton

14

Publications

260

Citations

8

H-Index

22

Concepts

All Affiliations

Loughborough UniversityKeele University
DJ

About

David J. Houlton is an author at Loughborough University specializing in engineering, surface science, and thin films.

Top Concepts

#ConceptH-IndexPublicationsCitations

1

Engineering

7

7

238

2

Chemistry

6

6

214

3

Applied Physics

5

5

196

4

Chemical Engineering

4

4

83

5

Natural Sciences

2

2

37

David J. Houlton

×

7

Publications

238

Citations

7

H-Index

YearCitations

Growth of ZnO by MOCVD using alkylzinc alkoxides as single-source precursors

John Auld, David J. Houlton, Anthony C. Jones,

Journal of Materials Chemistry

1994

82

Models of surface-confined metallocene derivatives

Irmi E. Buys, Trevor W. Hambley, David J. Houlton,

Journal of Molecular Catalysis

1994

53

Alternative precursor systems for the MOCVD of aluminium nitride and gallium nitride

S. Rushworth, Juliette R. Brown, David J. Houlton,

Advanced Materials for Optics and Electronics

1996

24

The Gas‐Sensing Properties of Tin Oxide Thin Films Deposited by Metallorganic Chemical Vapor Deposition

Juliette R. Brown, Melvyn T. Cheney, P.W. Haycock,

Journal of The Electrochemical Society

1997

22

Investigations into the growth of AIN by MOCVD using tri-tert butylaluminium as an alternative aluminium source

Anthony C. Jones, John Auld, S. Rushworth,

Journal of Materials Chemistry

1994

21

The deposition of platinum‐containing tin oxide thin films by metal‐organic CVD

David J. Houlton, Anthony C. Jones, P.W. Haycock,

Chemical Vapor Deposition

1995

20

Investigations into the growth of AIN by MOCVD using trimethylsilylazide as nitrogen source

John Auld, David J. Houlton, Anthony C. Jones,

Journal of Materials Chemistry

1994

16

Page 1