Concepedia

Wayne M. Moreau

WM

12

Publications

356

Citations

11

H-Index

1966

Active since

Affiliations

IBM (United States)(Current)

IBM Research - Thomas J. Watson Research Center

University of Wisconsin–Madison

Wayne M. Moreau is an author at IBM (United States) specializing in engineering, materials science, and chemistry.

Top concepts

EngineeringMaterial ScienceChemistryPolymer SciencePolymer ChemistryApplied PhysicsChemical EngineeringPolymersPhotochemistryMicroelectronics

Publications per year

1966–2001

12

Publications

12

Aqueous-based photoresist drying using supercritical carbon dioxide to prevent pattern collapse

Darı́o L. Goldfarb, Juan Pablo, Paul F. Nealey et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2000 · 123 citations

Engineering, Super-hydrophobic Surface, Soft Matter +17

Speed enhancement of PMMA resist

Wayne M. Moreau, David J. Merritt, Wendell W. Moyer et al. · Journal of Vacuum Science and Technology · 1979 · 41 citations

Engineering, Polymer Nanotechnology, Electron Beam Sensitivity +22

Recent progress in electron-beam resists for advanced mask-making

David R. Medeiros, Ari Aviram, C. R. Guarnieri et al. · IBM Journal of Research and Development · 2001 · 40 citations

Engineering, Electron-beam Lithography, Advanced Formulations +17

Charge-Transfer Complexes of Disulfides with Tetracyanoethylene

Wayne M. Moreau, Karl Weiss · Journal of the American Chemical Society · 1966 · 28 citations

Organic Charge-transfer Compound, Charge-transfer Complexes, Altmetrics +13

State Of Art Of Acrylate Resists: An Overview Of Polymer Structure And Lithographic Performance

Wayne M. Moreau · Optical Engineering · 1983 · 22 citations

Engineering, Electron-beam Lithography, Lithographic Performance +18

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