T. D. Bestwick

Statistics

Publications

Citations

255

H-Index

Active since

1990

Affiliations

IBM Research - Thomas J. Watson Research Center(Current)

Swedish Defence Research Agency

Linköping University

T. D. Bestwick is an author at IBM Research - Thomas J. Watson Research Center specializing in materials science, electronic materials, and materials engineering.

Publications per year

1990–1995

Publications

Studies of the reactive ion etching of SiGe alloys

G. S. Oehrlein, G. M. W. Kroesen, E. de Frésart et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1991 · 51 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +15

Nonintrusive wafer temperature measurement using <i>in</i> <i>situ</i> ellipsometry

G. M. W. Kroesen, G. S. Oehrlein, T. D. Bestwick · Journal of Applied Physics · 1991 · 39 citations · Full text

Natural Sciences, Materials Science, Physics +17

Selective Dry Etching of Germanium with Respect to Silicon and Vice Versa

G. S. Oehrlein, T. D. Bestwick, P. L. Jones et al. · Journal of The Electrochemical Society · 1991 · 38 citations · Full text

Engineering, Materials Engineering, Materials Science +17

Interactive effects in the reactive ion etching of SiGe alloys

G. S. Oehrlein, Ying Zhang, G. M. W. Kroesen et al. · Applied Physics Letters · 1991 · 36 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17

Photoluminescence characterization of plasma exposed silicon surfaces

Anne Henry, B. Ḿonemar, J. L. Lindström et al. · Journal of Applied Physics · 1991 · 31 citations

Engineering, Materials Engineering, Materials Science +17

1–5 of 8