Concepedia

Tomoyuki Nohda

TN

6

Publications

386

Citations

6

H-Index

1991

Active since

Affiliations

Sanyo (Japan)(Current)

Tomoyuki Nohda is an author at Sanyo (Japan) specializing in thin films, engineering, and applied physics.

Top concepts

Thin FilmsEngineeringApplied PhysicsMaterial ScienceOptoelectronicsMicroelectronicsOptical MaterialsElectrical EngineeringMicrofabricationLaser Applications

Publications per year

1991–2005

6

Publications

6

Enlargement of Poly-Si Film Grain Size by Excimer Laser Annealing and Its Application to High-Performance Poly-Si Thin Film Transistor

Hiroyuki Kuriyama, Seiichi Kiyama, Shigeru Noguchi et al. · Japanese Journal of Applied Physics · 1991 · 153 citations

Optical Materials, Engineering, Laser Applications +16

Lateral Grain Growth of Poly-Si Films with a Specific Orientation by an Excimer Laser Annealing Method

Hiroyuki Kuriyama, Tomoyuki Nohda, Satoshi Ishida et al. · Japanese Journal of Applied Physics · 1993 · 70 citations

Engineering, Thin Film Process Technology, Silicon On Insulator +18

Comprehensive Study of Lateral Grain Growth in Poly-Si Films by Excimer Laser Annealing and Its Application to Thin Film Transistors

Hiroyuki Kuriyama, Tomoyuki Nohda, Yoichirou Aya et al. · Japanese Journal of Applied Physics · 1994 · 63 citations

Materials Science, Excimer Laser Annealing, Electrical Engineering +15

Improving the Uniformity of Poly-Si Films Using a New Excimer Laser Annealing Method for Giant-Microelectronics

Hiroyuki Kuriyama, Takashi Kuwahara, Satoshi Ishida et al. · Japanese Journal of Applied Physics · 1992 · 56 citations

Optical Materials, Engineering, Optoelectronic Devices +19

High mobility poly-Si TFT by a new excimer laser annealing method for large area electronics

Hiroki Kuriyama, Seiichi Kiyama, Shigeru Noguchi et al. · 1991 · 33 citations

Optical Materials, Engineering, Thin-film Transistor +19

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