J. Seger

Morphological and phase stability of nickel–germanosilicide on Si1−xGex under thermal stress

Tobias Jarmar, J. Seger, Fredric Ericson et al. · Journal of Applied Physics · 2002 · 85 citations

Materials Science, Materials Engineering, Thermal Stress +15

Increased nucleation temperature of NiSi2 in the reaction of Ni thin films with Si1−xGex

J. Seger, S.-L. Zhang, D. Mangelinck et al. · Applied Physics Letters · 2002 · 64 citations

Engineering, Solid-state Chemistry, Chemistry +16

Lateral encroachment of Ni-silicides in the source/drain regions on ultrathin silicon-on-insulator

J. Seger, Per‐Erik Hellström, Jun Lü et al. · Applied Physics Letters · 2005 · 43 citations

Engineering, Lateral Encroachment, Silicon On Insulator +16

Morphological instability of NiSi1−uGeu on single-crystal and polycrystalline Si1−xGex

J. Seger, Tobias Jarmar, Z.-B. Zhang et al. · Journal of Applied Physics · 2004 · 33 citations

Engineering, Severe Plastic Deformation, Silicon On Insulator +16

A novel strained Si/sub 0.7/Ge/sub 0.3/ surface-channel pMOSFET with an ALD TiN/Al/sub 2/O/sub 3//HfAlO/sub x//Al/sub 2/O₃ gate stack

Depei Wu, A.-C. Lindgren, Stefan Persson et al. · IEEE Electron Device Letters · 2003 · 30 citations

Semiconductor Technology, Ald Tin/al/sub 2/O/sub, Electrical Engineering +12