Concepedia

Author

J. Seger

KTH Royal Institute of Technology

Also Known As

J. Seger, Johan Seger

22

Publications

332

Citations

8

H-Index

15

Concepts

All Affiliations

KTH Royal Institute of TechnologyUppsala UniversityCentre National de la Recherche Scientifique
JS

About

J. Seger is an author at KTH Royal Institute of Technology specializing in applied physics, engineering, and materials engineering.

Top Concepts

#ConceptH-IndexPublicationsCitations

1

Engineering

7

7

286

2

Applied Physics

7

7

286

3

Materials Engineering

4

4

194

4

Electrical Engineering

3

3

92

5

Chemistry

2

2

149

J. Seger

×

7

Publications

286

Citations

7

H-Index

YearCitations

Morphological and phase stability of nickel–germanosilicide on Si1−xGex under thermal stress

Tobias Jarmar, J. Seger, Fredric Ericson,

Journal of Applied Physics

2002

85

Increased nucleation temperature of NiSi2 in the reaction of Ni thin films with Si1−xGex

J. Seger, S.-L. Zhang, D. Mangelinck,

Applied Physics Letters

2002

64

Lateral encroachment of Ni-silicides in the source/drain regions on ultrathin silicon-on-insulator

J. Seger, Per‐Erik Hellström, Jun Lü,

Applied Physics Letters

2005

43

Morphological instability of NiSi1−uGeu on single-crystal and polycrystalline Si1−xGex

J. Seger, Tobias Jarmar, Z.-B. Zhang,

Journal of Applied Physics

2004

33

A novel strained Si/sub 0.7/Ge/sub 0.3/ surface-channel pMOSFET with an ALD TiN/Al/sub 2/O/sub 3//HfAlO/sub x//Al/sub 2/O<sub>3</sub> gate stack

Depei Wu, A.-C. Lindgren, Stefan Persson,

IEEE Electron Device Letters

2003

30

Control of Self-Heating in Thin Virtual Substrate Strained Si MOSFETs

Sarah H. Olsen, Enrique Escobedo‐Cousin, John B. Varzgar,

IEEE Transactions on Electron Devices

2006

19

Enhanced phase stability and morphological stability of Ni(Si,Ge) on strained Si0.8Ge0.2

J. Seger, S.-L. Zhang

Thin Solid Films

2003

12

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