G. Morello

Etching of InP-based MQW laser structure in a MOCVD reactor by chlorinated compounds

D. Bertone, R. Campi, G. Morello · Journal of Crystal Growth · 1998 · 23 citations

Engineering, Materials Engineering, Materials Science +16

Highly reliable and high-yield 1300-nm InGaAlAs directly modulated ridge fabry-Perot lasers, operating at 10-gb/s, up to 110/spl deg/C, with constant current swing

R. Paoletti, M. Agresti, D. Bertone et al. · Journal of Lightwave Technology · 2006 · 22 citations

Engineering, Electrical Engineering, Optoelectronics +16

Repetition rate, using a mode-locked hybrid distributed Bragg reflector (ML-HDBR) laser source

R. Paoletti, D. Bertone, Ruochen Fang et al. · IEEE Photonics Technology Letters · 2000 · 22 citations

Engineering, Electrical Engineering, Optical Materials +14

Hydrogen content of amorphous PECVD SiNx:H films by infrared spectroscopy and hydrogen forward scattering results

G. Morello · Journal of Non-Crystalline Solids · 1995 · 19 citations

Natural Sciences, Materials Engineering, Materials Science +12

Reactive ion etching induced damage evaluation for optoelectronic device fabrication

G. Morello, Marzia Quaglio, G. Meneghini et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2006 · 15 citations

Engineering, Electrical Engineering, Materials Science +17