Statistics
Publications
3
Citations
76
H-Index
3
Active since
2001
Affiliations
MIT Lincoln Laboratory(Current)
Michael Sworin is an author at MIT Lincoln Laboratory specializing in optical materials, optical properties, and chemistry.
Publications per year
2001–2013
3
3
High-resolution fluorocarbon-based resist for 157-nm lithography
Theodore H. Fedynyshyn, Roderick R. Kunz, Roger F. Sinta et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2001 · 18 citations
Optical Materials, Engineering, Electron-beam Lithography +17
High-resolution fluorocarbon-based resist for 157-nm lithography
Theodore H. Fedynyshyn, William A. Mowers, Roderick R. Kunz et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2002 · 15 citations
Optical Materials, Engineering, Electron-beam Lithography +24
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