Concepedia

Seiji Onoue

SO

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Publications

4

Citations

51

H-Index

4

Active since

2002

Affiliations

Toshiba (Japan)(Current)

Seiji Onoue is an author at Toshiba (Japan) specializing in materials science, surface science, and surface physics.

Publications per year

2002–2015

4

Publications

4

Predictable topography simulation of SiO<sub>2</sub>etching by C<sub>5</sub>F<sub>8</sub>gas combined with a plasma simulation, sheath model and chemical reaction model

Shigeyuki Takagi, Seiji Onoue, Katsumi Iyanagi et al. · Plasma Sources Science and Technology · 2003 · 16 citations

, , +17

Topography Simulation of Reactive Ion Etching Combined with Plasma Simulation, Sheath Model, and Surface Reaction Model

Shigeyuki Takagi, Katsumi Iyanagi, Seiji Onoue et al. · Japanese Journal of Applied Physics · 2002 · 13 citations

, , +17

A deep trench isolation integrated in a 0.13um BiCD process technology for analog power ICs

Hiroyoshi Kitahara, Tetsuya Tsukihara, Masaki Sakai et al. · 2009 · 12 citations

, , +13

Comparison of CF<sub>4</sub> and C<sub>4</sub>F<sub>8</sub> gas etching profiles by multiscale simulation

Shigeyuki Takagi, Seiji Onoue, Kazuhito Nishitani et al. · Japanese Journal of Applied Physics · 2015 · 10 citations

, , +13

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