Jarmo Skarp

Perfectly Conformal TiN and Al2O3 Films Deposited by Atomic Layer Deposition

Mikko Ritala, Markku Leskelä, Jan-Pieter Dekker et al. · Chemical Vapor Deposition · 1999 · 298 citations

Materials Science, Materials Engineering, Aluminium Nitride +15

Atomic layer epitaxy growth of doped zinc oxide thin films from organometals

Vesa Lujala, Jarmo Skarp, Markku Tammenmaa et al. · Applied Surface Science · 1994 · 184 citations

Materials Science, Engineering, Nanotechnology +6

Dependence of atomic layer-deposited Al2O3 films characteristics on growth temperature and Al precursors of Al(CH3)3 and AlCl3

Sun Jin Yun, Kyungho Lee, Jarmo Skarp et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1997 · 123 citations

Materials Science, Materials Engineering, Aluminium Nitride +14

Properties of Al2O3-films deposited on silicon by atomic layer epitaxy

Per Ericsson, Stefan Bengtsson, Jarmo Skarp · Microelectronic Engineering · 1997 · 47 citations

Materials Engineering, Materials Science, Aluminium Nitride +8

Silicon Surface Passivation by Al2O3: Effect of ALD Reactants

Päivikki Repo, H. Talvitie, Shuo Li et al. · Energy Procedia · 2011 · 39 citations · Full text

Materials Science, Semiconductors, Aluminium Nitride +15