Walter Däschner

Cost-effective mass fabrication of multilevel diffractive optical elements by use of a single optical exposure with a gray-scale mask on high-energy beam-sensitive glass

Walter Däschner, Pin Long, Robert Stein et al. · Applied Optics · 1997 · 99 citations

Optical Materials, Engineering, Electron-beam Lithography +17

General aspheric refractive micro-optics fabricated by optical lithography using a high energy beam sensitive glass gray-level mask

Walter Däschner, Pin Long, Robert J. Stein et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1996 · 63 citations

Optical Materials, Engineering, Electron-beam Lithography +23

Fabrication of diffractive optical elements using a single optical exposure with a gray level mask

Walter Däschner, Pin Long, Michael Larsson et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1995 · 53 citations

Multilevel Doe Fabrication, Optical Materials, Engineering +22

Fabrication of monolithic diffractive optical elements by the use of e-beam direct write on an analog resist and a single chemically assisted ion-beam-etching step

Walter Däschner, Michael Larsson, S. H. Lee · Applied Optics · 1995 · 51 citations

Optical Materials, Engineering, Electron-beam Lithography +18

<title>One-step lithography for mass production of multilevel diffractive optical elements using high-energy beam sensitive (HEBS) gray-level mask</title>

Walter Däschner, Robert Stein, Pin Long et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1996 · 29 citations

Doe Structure, Holography, Optical Materials +20