Concepedia

William T. Brogan

WT

4

Publications

56

Citations

4

H-Index

1969

Active since

Affiliations

MIT Lincoln Laboratory(Current)

Massachusetts Institute of Technology

William T. Brogan is an author at MIT Lincoln Laboratory specializing in engineering, applied physics, and thin films.

Top concepts

Thin FilmsEngineeringApplied PhysicsSurface ScienceMaterial SciencePhysicsMagnetismProcess ControlSuperconductivityCrystalline Defects

Publications per year

1969–1992

4

Publications

4

A high-flux atomic oxygen source for the deposition of high <i>T</i> <i>c</i> superconducting films

L.S. Yu-Jahnes, William T. Brogan, Alfredo C. Anderson et al. · Review of Scientific Instruments · 1992 · 18 citations

Materials Science, Superconducting Material, High-tc Superconductivity +13

Effect of Oxygen on the Formation of Germanium Films

Robert F. Adamsky, Klaus Behrndt, William T. Brogan · Journal of Vacuum Science and Technology · 1969 · 15 citations

Materials Science, Epitaxial Growth, Engineering +12

Process control for the low temperature deposition of niobium-nitride thin films

Adam Campbell Anderson, Daniel J. Lichtenwalner, William T. Brogan · IEEE Transactions on Magnetics · 1989 · 13 citations

Engineering, Thin Film Process Technology, Chemical Deposition +17

Ion-Beam Etching of Surface Gratings

Henry I. Smith, J. Melngailis, R.C. Williamson et al. · 1973 · 10 citations

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