Timothy J. Leedham - Concepedia

Author

Timothy J. Leedham

Also Known As

Leedham, T., Leedham, T.J., T. J. LEEDHAM, T. J. Leedham, T. Leedham, T.J Leedham, T.J. Leedham, Timothy J Leedham, Timothy J. Leedham, Timothy J.Leedham

Publications

Citations

H-Index

Concepts

All Affiliations

University of Liverpool Imperial College London Loughborough University Cranfield University University of Salford

About

Timothy J. Leedham is an author at University of Liverpool specializing in engineering, materials science, and chemistry.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	19	24	872
2	Applied Physics	6	6	274
3	Chemical Engineering	5	5	127
4	Natural Sciences	2	2	59
5	Biomolecular Engineering	1	1	22

Timothy J. Leedham

Publications

938

Citations

H-Index

Page 1

	Year	Citations
Nickel oxide sol–gel films from nickel diacetate for electrochromic applications J.L Garcia-Miquel, Qi Zhang, Stephanie Allen, Thin Solid Films Materials ScienceEngineeringElectrode-electrolyte InterfaceNickel DiacetateSol-gel Synthesis	2003	93
Synthesis and characterisation of two novel titanium isopropoxides stabilised with a chelating alkoxide: their use in the liquid injection MOCVD of titanium dioxide thin films Anthony C. Jones, Timothy J. Leedham, P.J. Wright, Journal of Materials Chemistry Materials ScienceInorganic ChemistryEngineeringInorganic PhotochemistryOxidation Resistance	1998	75
Recent Materials Characterizations of [2D] and [3D] Thin Film Ferroelectric Structures J. F. Scott, Finlay D. Morrison, Masato Miyake, Journal of the American Ceramic Society Materials ScienceMaterials EngineeringMultiferroicsFerroelasticsEngineering	2005	71
MOCVD of Zirconia Thin Films by Direct Liquid Injection Using a New Class of Zirconium Precursor Anthony C. Jones, Timothy J. Leedham, P.J. Wright, Chemical Vapor Deposition Materials ScienceMaterials EngineeringIi-vi SemiconductorDirect Liquid InjectionEngineering	1998	69
Crystal Structure of Bi(OCMe2CH2OMe)3 and Its Use in the MOCVD of Bi2O3 Paul A. Williams, A.C. Jones, Michael J. Crosbie, Chemical Vapor Deposition Materials ScienceInorganic ChemistryBismuth OxideCrystal StructureEngineering	2001	63
MOCVD of Strontium Tantalate Thin Films Using Novel Bimetallic Alkoxide Precursors Michael J. Crosbie, P.J. Wright, Hywel O. Davies, Chemical Vapor Deposition Materials ScienceLead-free PerovskitesEngineeringPerovskite Solar CellOxide Electronics	1999	48
Atomic layer deposition of ZrO2 thin films using a new alkoxide precursor Raija Matero, Mikko Ritala, Markku Leskelä, Journal of Non-Crystalline Solids Materials ScienceEngineeringOxide ElectronicsSurface ScienceApplied Physics	2002	48
Novel mononuclear zirconium and hafnium alkoxides; improved precursors for the MOCVD of ZrO2 and HfO2 Paul A. Williams, John L. Roberts, Anthony C. Jones, Journal of Materials Chemistry EngineeringZirconium DioxideChemistryChemical DepositionInorganic Material	2001	47
Infrared and Raman spectra of 1,5-cyclooctadiene complexes of rhodium, palladium and platinum D.B. Powell, Timothy J. Leedham Spectrochimica Acta Part A Molecular Spectroscopy Raman SpectraInorganic ChemistryChemical EngineeringEngineeringNatural Sciences	1972	37
Synthesis and crystal structures of dimethylaminoethanol adducts of Ni(ii) acetate and Ni(ii) acetylacetonate. Precursors for the sol–gel deposition of electrochromic nickel oxide thin films Paul A. Williams, Anthony C. Jones, J.F. Bickley, Journal of Materials Chemistry Materials ScienceInorganic ChemistryDimethylaminoethanol AdductsEngineeringCoordination Complex	2001	37

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