J Vyskočil

P3: An installation for high-energy density plasma physics and ultra-high intensity laser–matter interaction at ELI-Beamlines

S. Weber, S. Bechet, S. Borneis et al. · Matter and Radiation at Extremes · 2017 · 149 citations · Full text

Photonics, Engineering, Physics +13

New results in d.c. reactive magnetron deposition of TiNx films

J. Musil, S. Kadlec, J Vyskočil et al. · Thin Solid Films · 1988 · 84 citations

Materials Science, Magnetism, Materials Engineering +8

Gas aggregation nanocluster source — Reactive sputter deposition of copper and titanium nanoclusters

A. Marek, J. Valter, S. Kadlec et al. · Surface and Coatings Technology · 2010 · 69 citations

Materials Science, Chemical Engineering, Engineering +6

Arc evaporation of hard coatings: Process and film properties

J Vyskočil, J. Musil · Surface and Coatings Technology · 1990 · 61 citations

Materials Science, Engineering, Surface Science +3

Cathodic arc evaporation in thin film technology

J Vyskočil, J. Musil · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1992 · 61 citations · Full text

Materials Science, Chemical Engineering, Ti Arc Plasma +15