K.H. Jackson

Low Pressure Nitrided‐Oxide as a Thin Gate Dielectric for MOSFET's

S.S. Wong, C.G. Sodini, T.W. Ekstedt et al. · Journal of The Electrochemical Society · 1983 · 72 citations · Full text

Engineering, Auger Analysis, Thin Film Process Technology +17

Polarization of Fluorescence Following Molecular Photoionization

E. D. Poliakoff, J. L. Dehmer, Dan Dill et al. · Physical Review Letters · 1981 · 72 citations

Engineering, Ionic State, Chemistry +20

Polarized fluorescence from photodissociation fragments: a study of ICN photolysis using synchrotron radiation

E. D. Poliakoff, S. H. Southworth, D. A. Shirley et al. · Chemical Physics Letters · 1979 · 24 citations

Photochemistry, Physics, Icn Photolysis +8

Studies of electron avalanche behavior in liquid argon

J.G. Kim, Syed Mohd Fairuz Syed Mohd Dardin, K.H. Jackson et al. · IEEE Transactions on Nuclear Science · 2002 · 20 citations · Full text

Low-pressure growth of single-crystal silicon carbide

Gary Harris, K.H. Jackson, G.J. Felton et al. · Materials Letters · 1986 · 17 citations

Materials Engineering, Materials Science, Low-pressure Growth +6