G. L. Liu

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Active since

2006

Affiliations

Semiconductor Energy Laboratory (Japan)(Current)

The University of Tokyo

G. L. Liu is an author at Semiconductor Energy Laboratory (Japan) specializing in x-ray photoelectron spectroscopy, interface science, and semiconductor materials.

Publications per year

2006–2006

Publications

Mechanism of Hf-silicide formation at interface between poly-Si electrode and HfO2∕Si gate stacks studied by photoemission and x-ray absorption spectroscopy

H. Takahashi, Jun Okabayashi, Satoshi Toyoda et al. · Journal of Applied Physics · 2006 · 19 citations

Engineering, Materials Engineering, Materials Science +17

Annealing-time dependence in interfacial reaction between poly-Si electrode and HfO2∕Si gate stack studied by synchrotron radiation photoemission and x-ray absorption spectroscopy

H. Takahashi, Jun Okabayashi, Satoshi Toyoda et al. · Applied Physics Letters · 2006 · 15 citations

Engineering, Materials Engineering, Materials Science +17

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