Hirotaka Sano

Nanosilicon dot arrays with a bit pitch and a track pitch of 25nm formed by electron-beam drawing and reactive ion etching for 1Tbit∕in.2 storage

Sumio Hosaka, Hirotaka Sano, Masumi Shirai et al. · Applied Physics Letters · 2006 · 45 citations

Engineering, Electron-beam Lithography, Silicon On Insulator +17

Possibility to form an ultrahigh packed fine pit and dot arrays for future storage using EB writing

Sumio Hosaka, Hirotaka Sano, Kazuo Itoh et al. · Microelectronic Engineering · 2006 · 27 citations

Materials Engineering, Materials Science, Advanced Packaging +11

Extremely Small Proximity Effect in 30 keV Electron Beam Drawing with Thin Calixarene Resist for 20×20 nm²Pitch Dot Arrays

Sumio Hosaka, Zulfakri bin Mohamad, Masumi Shira et al. · Applied Physics Express · 2008 · 24 citations

Engineering, Electron-beam Lithography, Electron Diffraction +21

Nano-dot and -pit arrays with a pitch of 25 nm × 25 nm fabricated by EB drawing, RIE and nano-imprinting for 1 Tb/in2 storage

Sumio Hosaka, Zulfakri bin Mohamad, Masumi Shirai et al. · Microelectronic Engineering · 2008 · 20 citations

Materials Science, Tb/in2 Storage, Engineering +15

Pressure-induced superconductivity in boron-doped Buckypapers

Jun Nakamura, M. Matsudaira, J. Haruyama et al. · Applied Physics Letters · 2009 · 12 citations

Superconducting Material, Nanosheet, Engineering +20