Masumi Shirai

Nanosilicon dot arrays with a bit pitch and a track pitch of 25nm formed by electron-beam drawing and reactive ion etching for 1Tbit∕in.2 storage

Sumio Hosaka, Hirotaka Sano, Masumi Shirai et al. · Applied Physics Letters · 2006 · 45 citations

Engineering, Electron-beam Lithography, Silicon On Insulator +17

Formation of dot arrays with a pitch of 20 nm × 20 nm for patterned media using 30 keV EB drawing on thin calixarene resist

Zulfakri bin Mohamad, Masumi Shirai, Hayato Sone et al. · Nanotechnology · 2007 · 22 citations

Engineering, Electron-beam Lithography, Electron Diffraction +19

Nano-dot and -pit arrays with a pitch of 25 nm × 25 nm fabricated by EB drawing, RIE and nano-imprinting for 1 Tb/in2 storage

Sumio Hosaka, Zulfakri bin Mohamad, Masumi Shirai et al. · Microelectronic Engineering · 2008 · 20 citations

Materials Science, Tb/in2 Storage, Engineering +15

Possibility of Forming 18-nm-Pitch Ultrahigh Density Fine Dot Arrays for 2 Tbit/in.²Patterned Media Using 30-keV Electron Beam Lithography

Sumio Hosaka, Yasunari Tanaka, Masumi Shirai et al. · Japanese Journal of Applied Physics · 2010 · 17 citations

Nano-dot arrays with a bit pitch and a track pitch of 25 nm formed by EB writing for 1 Tb/in2 storage

Sumio Hosaka, Hirotaka Sano, Masumi Shirai et al. · Microelectronic Engineering · 2007 · 12 citations

Engineering, Physics, Nanomaterials +11