Walter P. Skoczylas

High brightness inductively coupled plasma source for high current focused ion beam applications

Noel Smith, Walter P. Skoczylas, Sean M. Kellogg et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2006 · 150 citations · Full text

Optical Materials, Engineering, Ion Beam Instrumentation +19

Simultaneous Correction of Spherical and Chromatic Aberrations with an Electron Mirror: An Electron Optical Achromat

Gertrude F. Rempfer, Denis Desloge, Walter P. Skoczylas et al. · Microscopy and Microanalysis · 1997 · 66 citations

Optical Materials, Engineering, Microscopy +21

A proposed modular imaging system for photoelectron and electron probe microscopy with aberration correction, and for mirror microscopy and low-energy electron microscopy

Walter P. Skoczylas, Gertrude F. Rempfer, O. Hayes Griffith · Ultramicroscopy · 1991 · 31 citations

Engineering, Electron Microscopy, Physics +11

Image properties in an aberration-corrected photoemission electron microscope

R. Könenkamp, Thouis R. Jones, J. Elstner et al. · Physics Procedia · 2008 · 18 citations · Full text

Evaluation of aberration coefficients of practical electrostatic lenses for X-ray absorption micro-spectroscopy and imaging

Douglas Dunham, Denis Desloge, Gertrude F. Rempfer et al. · Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment · 1994 · 10 citations

Materials Science, X-ray Spectroscopy, Engineering +14