J. Etrillard

Microfabrication and optical study of reactive ion etched InGaAsP/InP and GaAs/GaAlAs quantum wires

A. Izraël, B. Sermage, J. Y. Marzin et al. · Applied Physics Letters · 1990 · 56 citations

Electrical Engineering, Optical Materials, Engineering +13

Anisotropic etching of InP with low sidewall and surface induced damage in inductively coupled plasma etching using SiCl4

J. Etrillard, P. Ossart, G. Patriarche et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1997 · 52 citations

Engineering, Sidewall Damage, Plasma Processing +18

Sidewall and surface induced damage comparison between reactive ion etching and inductive plasma etching of InP using a CH4/H2/O2 gas mixture

J. Etrillard, F. Héliot, P. Ossart et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1996 · 39 citations

Ch4/h2/o2 Gas Mixture, Engineering, Chemistry +18

Fabrication of two-dimensional photonic lattices in GaAs: the regular graphite structures

Y. Chen, G. Faini, H. Launois et al. · Superlattices and Microstructures · 1997 · 17 citations

Materials Science, Photonics, Engineering +9

+55°C pulse lasing at 1.56 µm of all-monolithicInGaAlAs/InP vertical cavity lasers

C. Kazmierski, J.P. Debray, R. Madani et al. · Electronics Letters · 1999 · 13 citations