Wonnyoung Jeong

Influence of Additive N2 on O2 Plasma Ashing Process in Inductively Coupled Plasma

Yebin You, Youngseok Lee, Sijun Kim et al. · Nanomaterials · 2022 · 14 citations · Full text

Characterization of an Etch Profile at a Wafer Edge in Capacitively Coupled Plasma

Inho Seong, Jinho Lee, Sijun Kim et al. · Nanomaterials · 2022 · 12 citations · Full text

Characterization of SiO2 Plasma Etching with Perfluorocarbon (C4F8 and C6F6) and Hydrofluorocarbon (CHF3 and C4H2F6) Precursors for the Greenhouse Gas Emissions Reduction

Minsu Choi, Youngseok Lee, Yebin You et al. · Materials · 2023 · 11 citations · Full text

Contribution of Ion Energy and Flux on High-Aspect Ratio SiO2 Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/C4F8 Plasma: Individual Ion Energy and Flux Controlled

Wonnyoung Jeong, Sijun Kim, Youngseok Lee et al. · Materials · 2023 · 10 citations · Full text