M. Mejias

Electron beam lithography: resolution limits and applications

Christophe Vieu, F. Carcenac, A. Pépin et al. · Applied Surface Science · 2000 · 1.1K citations

Electron-beam Lithography, Beam Lithography, Microscopy +3

Temperature behavior of multiple tunnel junction devices based on disordered dot arrays

A. S. Cordan, Y. Leroy, A. Goltzené et al. · Journal of Applied Physics · 2000 · 52 citations

Engineering, Disordered Dot Arrays, Nanocomputing +17

Electron transport in metallic dot arrays: Effect of a broad dispersion in the tunnel junction dimensions

A. S. Cordan, A. Goltzené, Y. Hervé et al. · Journal of Applied Physics · 1998 · 31 citations

Engineering, Vlsi Design, One-dimensional Multijunction Array +18

Temperature evolution of multiple tunnel junction devices made with disordered two-dimensional arrays of metallic islands

A. Pépin, Christophe Vieu, M. Mejias et al. · Applied Physics Letters · 1999 · 22 citations

Engineering, Coulomb Gap, Semiconductor Device +17

Nanofabrication at a 10 nm length scale: Limits of lift-off and electroplating transfer processes

Anne‐Marie Haghiri‐Gosnet, C. Vieu, G. Simon et al. · Journal de Physique IV (Proceedings) · 1999 · 20 citations