M.L.A. Dass is an author at Intel (United States) specializing in applied physics, surface science, and materials engineering.
Top concepts
EngineeringApplied PhysicsSurface ScienceMaterial ScienceMaterials EngineeringChemistryThin FilmsMicrostructureNanoelectronicsMechanical Engineering
Publications per year
1991–2003
3
3
Growth of epitaxial CoSi2 on (100)Si
M.L.A. Dass, David B. Fraser, Chih‐Shih Wei · Applied Physics Letters · 1991 · 270 citations
Materials Science, Materials Engineering, Epitaxial Cosi2 +13
Srinivasan Sivaram, M.L.A. Dass, Bryan Tracy et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1993 · 14 citations
Materials Engineering, Materials Science, Microstructural Properties +15
Comparison of cobalt and titanium silicides for SALICIDE process and shallow junction formation
C. S. Wei, G. Raghavan, M.L.A. Dass et al. · 2003 · 10 citations
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