W. Füssel

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Publications

Citations

295

H-Index

Active since

1977

Affiliations

Fraunhofer Institute for Telecommunications, Heinrich Hertz Institute(Current)

W. Füssel is an author at Fraunhofer Institute for Telecommunications, Heinrich Hertz Institute specializing in engineering, applied physics, and surface science.

Top concepts

EngineeringApplied PhysicsSurface ScienceMaterial SciencePhysicsMicroelectronicsNanoelectronicsElectrical EngineeringSemiconductorsOptoelectronics

Publications per year

1977–2000

Publications

Defects at the Si/SiO2 interface: Their nature and behaviour in technological processes and stress

W. Füssel, M. Schmidt, H. Angermann et al. · Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment · 1996 · 105 citations

Materials Science, Engineering, Nanoelectronics +9

IR study of short-range and local order in SiO2 and SiOx films

I. P. Lisovskiĭ, V.B. Lozinskii, S.I. Frolov et al. · Journal of Non-Crystalline Solids · 1995 · 60 citations

Materials Science, Optical Materials, Siox Films +10

Capture cross sections of defect states at the Si/SiO2 interface

J. Albohn, W. Füssel, Ngo Duong Sinh et al. · Journal of Applied Physics · 2000 · 53 citations

Semiconductors, Electrical Engineering, Energetic Separation +15

Electronic properties of the HF-passivated Si(111) surface during the initial oxidation in air

Th. Dittrich, H. Angermann, W. Füssel et al. · physica status solidi (a) · 1993 · 24 citations

Surface Characterization, Electrical Engineering, Engineering +12

Interface states of the Si/SiO2 system and their separation in groups

H. Flietner, W. Füssel, Ngo Duong Sinh · physica status solidi (a) · 1977 · 16 citations

Engineering, Physics, Interface States +8

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