Defects at the Si/SiO2 interface: Their nature and behaviour in technological processes and stress - Concepedia

Concepedia

Publication | Closed Access

Defects at the Si/SiO2 interface: Their nature and behaviour in technological processes and stress

105

Citations

19

References

1996

Year

W. Füssel, M. Schmidt, H. Angermann, G. Mende, H. Flietner

Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment

Materials ScienceEngineeringNanoelectronicsApplied PhysicsSiliceneDefect FormationSemiconductor Device FabricationSilicon On InsulatorMicroelectronicsTechnological ProcessesSi/sio2 InterfaceSilicon Debugging

References

	Year	Citations

Page 1