Osamu Komuro

Characterization of line-edge roughness in resist patterns and estimations of its effect on device performance

Atsuko Yamaguchi, Ryuta Tsuchiya, Hiroshi Fukuda et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 53 citations

Engineering, Electrical Engineering, Materials Science +17

Characterization of Line Edge Roughness in Resist Patterns by Using Fourier Analysis and Auto-Correlation Function

Atsuko Yamaguchi, Osamu Komuro · Japanese Journal of Applied Physics · 2003 · 38 citations

Natural Sciences, Electrical Engineering, Physics +16

Characterizing cross-sectional profile variations by using multiple parameters extracted from top-down SEM images

Chie Shishido, Yuji Takagi, Maki Tanaka et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2002 · 14 citations

Engineering, Electrical Engineering, Materials Science +14

Dose and focus estimation using top-down SEM images

Chie Shishido, Ryo Nakagaki, Maki Tanaka et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 13 citations

Engineering, Biomedical Engineering, Metrology +12