Concepedia

Claire Sourd

CS

Statistics

Publications

7

Citations

208

H-Index

7

Active since

2006

Affiliations

Commissariat à l'Énergie Atomique et aux Énergies Alternatives(Current)

CEA Grenoble

Laboratoire d'Électronique des Technologies de l'Information

Université Grenoble Alpes

Institut polytechnique de Grenoble

Claire Sourd is an author at Commissariat à l'Énergie Atomique et aux Énergies Alternatives specializing in materials science, materials engineering, and natural sciences.

Publications per year

2006–2011

7

Publications

7

Mechanisms involved in HBr and Ar cure plasma treatments applied to 193 nm photoresists

E. Pargon, K. Menguelti, M. Martin et al. · Journal of Applied Physics · 2009 · 73 citations

, , +16

Hyperbranched Polymers for Photolithographic Applications – Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances

Christos L. Chochos, Esma Ismailova, Cyril Brochon et al. · Advanced Materials · 2008 · 44 citations

, , +17

HBr Plasma Treatment Versus VUV Light Treatment to Improve 193 nm Photoresist Pattern Linewidth Roughness

E. Pargon, L. Azarnouche, Marc Fouchier et al. · Plasma Processes and Polymers · 2011 · 29 citations

, , +13

Epoxy silsesquioxane resists for UV nanoimprint lithography

J. de Girolamo, Mustapha Chouiki, J.H. Tortai et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2008 · 20 citations

, , +17

Chemically amplified photoresists for 193‐nm photolithography: Effect of molecular structure and photonic parameters on photopatterning

Hassan Ridaoui, Ali Dirani, Olivier Soppera et al. · Journal of Polymer Science Part A Polymer Chemistry · 2010 · 17 citations · Full text

, , +17

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