F. Adibi

Average energy deposited per atom: A universal parameter for describing ion-assisted film growth?

I. Petrov, F. Adibi, J. E. Greene et al. · Applied Physics Letters · 1993 · 223 citations

Engineering, Ion-assisted Film Growth, Chemistry +23

Crystal growth and microstructure of polycrystalline Ti1−xAlxN alloy films deposited by ultra-high-vacuum dual-target magnetron sputtering

U. Wahlström, Lars Hultman, J.‐E. Sundgren et al. · Thin Solid Films · 1993 · 207 citations

Materials Engineering, Materials Science, Engineering +6

Use of an externally applied axial magnetic field to control ion/neutral flux ratios incident at the substrate during magnetron sputter deposition

I. Petrov, F. Adibi, J. E. Greene et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1992 · 192 citations

Magnetism, Electrical Engineering, Plasma Electronics +15

Effects of high-flux low-energy (20–100 eV) ion irradiation during deposition on the microstructure and preferred orientation of Ti0.5Al0.5N alloys grown by ultra-high-vacuum reactive magnetron sputtering

F. Adibi, I. Petrov, J. E. Greene et al. · Journal of Applied Physics · 1993 · 170 citations

Magnetic Properties, Ion Energy Ei, Engineering +20

Defect structure and phase transitions in epitaxial metastable cubic Ti0.5Al0.5N alloys grown on MgO(001) by ultra-high-vacuum magnetron sputter deposition

F. Adibi, I. Petrov, Lars Hultman et al. · Journal of Applied Physics · 1991 · 149 citations

Materials Science, Magnetism, Phase Transitions +13