J. E. Greene

Polycrystalline TiN films deposited by reactive bias magnetron sputtering: Effects of ion bombardment on resputtering rates, film composition, and microstructure

I. Petrov, Lars Hultman, J.‐E. Sundgren et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1992 · 238 citations

Natural Sciences, Materials Engineering, Materials Science +15

Use of an externally applied axial magnetic field to control ion/neutral flux ratios incident at the substrate during magnetron sputter deposition

I. Petrov, F. Adibi, J. E. Greene et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1992 · 193 citations

Natural Sciences, Materials Science, Physics +13

Reactive magnetron sputter deposited CN<i>x</i>: Effects of N2 pressure and growth temperature on film composition, bonding, and microstructure

Weitao Zheng, H. Sjöström, Ivan G. Ivanov et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1996 · 178 citations

Natural Sciences, Materials Engineering, Materials Science +14

Low-energy (∼100 eV) ion irradiation during growth of TiN deposited by reactive magnetron sputtering: Effects of ion flux on film microstructure

Lars Hultman, W.‐D. Münz, J. Musil et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1991 · 164 citations

Natural Sciences, Materials Engineering, Materials Science +16

Electronic structure of ScN determined using optical spectroscopy, photoemission, and<i>ab initio</i>calculations

Daniel Gall, M. Städele, Kenneth Järrendahl et al. · Physical review. B, Condensed matter · 2001 · 164 citations

Natural Sciences, Materials Science, Physics +17