Samuel Kalt

Development and characterisation of a new line width reference material

Gaoliang Dai, Fan Zhu, Markus Heidelmann et al. · Measurement Science and Technology · 2015 · 41 citations

Natural Sciences, Materials Engineering, Materials Science +17

Recent CD AFM probe developments for sub-45 nm technology nodes

Bernard Haochih Liu, Jason Osborne, Gregory A. Dahlen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 11 citations

Engineering, Electrical Engineering, Instrumentation +11

Electron projection lithography mask format layer stress measurement and simulation of pattern transfer distortion

Phillip L. Reu, Cheng‐fu Chen, Roxann L. Engelstad et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2002 · 11 citations

Engineering, Manufacturing Engineering, Materials Science +17