Argon Cluster Ion Beams for Organic Depth Profiling: Results from a VAMAS Interlaboratory Study

Alexander G. Shard, Rasmus Havelund, M. P. Seah, +8

Analytical Chemistry

Removal of Ar ⁺ beam‐induced damaged layers from polyimide surfaces with argon gas cluster ion beams

Takuya Miyayama, N. Sanada, Scott R. Bryan, +2

Surface and Interface Analysis

X-ray photoelectron spectroscopy study of polyimide thin films with Ar cluster ion depth profiling

Takuya Miyayama, N. Sanada, M. Suzuki, +3

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

X-ray SpectroscopyEngineeringElectron-beam LithographyChemistryIon Implantation +15

Concepts for chemical state analysis at constant probing depth by lab‐based XPS/HAXPES combining soft and hard X‐ray sources

Sebastian Siol, Jennifer E. Mann, John Newman, +5

Surface and Interface Analysis

The effect of angle of incidence to low damage sputtering of organic polymers using a C60 ion beam

Takuya Miyayama, N. Sanada, Shin‐ichi Iida, +2

Applied Surface Science

Materials EngineeringMaterials ScienceEngineeringBeam LithographyElectron-beam Lithography +9

Palmitic acid, verified by lipid profiling using secondary ion mass spectrometry, demonstrates anti-multiple myeloma activity

Yasuyuki Nagata, Itsuko Ishizaki, Michihiko Waki, +5

Leukemia Research

Hematological MalignancyAnti-multiple Myeloma ActivityMedicineImmunologyPalmitic Acid +4

X-ray Photoelectron Spectroscopy Equipped with Gas Cluster Ion Beams for Evaluation of the Sputtering Behavior of Various Nanomaterials

Hsun‐Yun Chang, Wei‐Chun Lin, Po-Chih Chu, +5

ACS Applied Nano Materials

X-ray SpectroscopyEngineeringSputtering BehaviorRapid SputteringChemistry +16

The electronic band structure analysis of OLED device by means of in situ LEIPS and UPS combined with GCIB

Masahiro Terashima, Takuya Miyayama, Tetsuro Shirao, +4

Surface and Interface Analysis

Materials ScienceElectrical EngineeringElectronic DevicesEngineeringElectronic Materials +13

Characterization of cathode-electrolyte interface in all-solid-state batteries using TOF-SIMS, XPS, and UPS/LEIPS

Shin‐ichi Iida, Masahiro Terashima, K. Mamiya, +5

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

Materials ScienceElectric BatteryElectrical EngineeringChemical EngineeringAll-solid-state Batteries +12

Plasma-tolerant structure for organic light-emitting diodes with aluminum cathodes fabricated by DC magnetron sputtering: Using a Li-doped electron transport layer

Hiroshi Fujimoto, Takuya Miyayama, N. Sanada, +1

Organic Electronics

White OledDc Magnetron SputteringElectrical EngineeringSolid-state LightingEngineering +6