Heber Hernandez‐Arriaga

Growth of HfO2/TiO2 nanolaminates by atomic layer deposition and HfO2-TiO2 by atomic partial layer deposition

Heber Hernandez‐Arriaga, E. Luna, E. Martı́nez et al. · Journal of Applied Physics · 2017 · 69 citations

Materials Science, Materials Engineering, Chemical Engineering +14

Low‐Thermal‐Budget Fluorite‐Structure Ferroelectrics for Future Electronic Device Applications

Hyojeong Kim, Yonghwan An, Yong Chan Jung et al. · physica status solidi (RRL) - Rapid Research Letters · 2021 · 37 citations

Materials Science, Materials Engineering, Multiferroics +14

Improvement in ferroelectricity and breakdown voltage of over 20-nm-thick HfxZr1−xO2/ZrO2 bilayer by atomic layer deposition

Takashi Onaya, Toshihide Nabatame, Mari Inoue et al. · Applied Physics Letters · 2020 · 33 citations

Materials Science, 20-Nm-thick Hfxzr1−xo2/zro2 Bilayer, Electrical Engineering +13

Ferroelectric polarization retention with scaling of Hf0.5Zr0.5O2 on silicon

Jaidah Mohan, Heber Hernandez‐Arriaga, Yong Chan Jung et al. · Applied Physics Letters · 2021 · 32 citations · Full text

Materials Science, Layer Thickness, Electrical Engineering +15

Design and Fabrication of Interdigital Nanocapacitors Coated with HfO2

Gabriel González, Eleazar Samuel Kolosovas‐Machuca, E. Luna et al. · Sensors · 2015 · 24 citations · Full text

Interdigital Capacitors, Engineering, Hybrid Capacitor +17