Heber Hernandez‐Arriaga

Author

Also Known As

H. Hernández-Arriaga, Heber Hernandez-Arriaga, Heber Hernandez‐Arriaga, Heber Hernández-Arriaga, Hye Ryeon Park, Jin-Hyun Kim, Minjong Lee, Namhoon Kim

Publications

342

Citations

H-Index

Concepts

All Affiliations

The University of Texas at Dallas Meiji University Japan Society for the Promotion of Science National Institute for Materials Science Kangwon National University

About

Heber Hernandez‐Arriaga is an author at The University of Texas at Dallas specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	8	8	243
2	Applied Physics	8	8	243
3	Natural Sciences	1	1	24
4	Chemical Engineering	1	1	69
5	Chemistry	1	1	24

Heber Hernandez‐Arriaga

Publications

243

Citations

H-Index

Page 1

	Year	Citations
Growth of HfO2/TiO2 nanolaminates by atomic layer deposition and HfO2-TiO2 by atomic partial layer deposition Heber Hernandez‐Arriaga, E. Luna, E. Martı́nez, Journal of Applied Physics Materials ScienceMaterials EngineeringChemical EngineeringSurface CharacterizationEngineering	2017	69
Low‐Thermal‐Budget Fluorite‐Structure Ferroelectrics for Future Electronic Device Applications Hyojeong Kim, Yonghwan An, Yong Chan Jung, physica status solidi (RRL) - Rapid Research Letters Materials ScienceMaterials EngineeringMultiferroicsMagnetic PropertiesEngineering	2021	37
Improvement in ferroelectricity and breakdown voltage of over 20-nm-thick HfxZr1−xO2/ZrO2 bilayer by atomic layer deposition Takashi Onaya, Toshihide Nabatame, Mari Inoue, Applied Physics Letters Materials Science20-Nm-thick Hfxzr1−xo2/zro2 BilayerElectrical EngineeringMultiferroicsHz15 Capacitor	2020	33
Ferroelectric polarization retention with scaling of Hf0.5Zr0.5O2 on silicon Jaidah Mohan, Heber Hernandez‐Arriaga, Yong Chan Jung, Applied Physics Letters Materials ScienceLayer ThicknessElectrical EngineeringMultiferroicsPolarization Retention	2021	32
Design and Fabrication of Interdigital Nanocapacitors Coated with HfO2 Gabriel González, Eleazar Samuel Kolosovas‐Machuca, E. Luna, Sensors Interdigital CapacitorsEngineeringHybrid CapacitorSilicon SubstratesInterconnect (Integrated Circuits)	2015	24
Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1−xO2 thin films using synchrotron x-ray analysis Takashi Onaya, Toshihide Nabatame, Yong Chan Jung, APL Materials EngineeringHfxzr1−xo2 Thin FilmsThin Film Process TechnologyChemistryConventional X-ray Diffraction	2021	24
Improvement of Ferroelectricity and Fatigue Property of Thicker Hf<sub>x</sub>Zr<sub>1−X</sub>O<sub>2</sub>/ZrO<sub>2</sub> Bi-layer Takashi Onaya, Toshihide Nabatame, Mari Inoue, ECS Transactions Materials ScienceMultiferroicsFerromagnetismEngineeringFerroelectric Application	2020	12
Relaxation Induced by Imprint Phenomena in Low-Temperature (400 °C) Processed Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub>-Based Metal-Ferroelectric-Metal Capacitors Jaidah Mohan, Yong Chan Jung, Heber Hernandez‐Arriaga, ACS Applied Electronic Materials EngineeringMetal-ferroelectric-metal CapacitorsFerroelectric Random-access MemoryPolarization RelaxationMultiferroics	2022	12

Page 1